Self⁃assembled monolayer films of i⁃salicylaldehyde⁃o⁃phenylenediamine (A) and di⁃o⁃vanillin⁃o⁃phenylenediamine (B) were fabricated respectively on copper electrode surface by molecular self⁃assembled process. The corrosion inhibition performance of the Schiff bases self⁃assembled films (SAMs) in 3.5% NaCl solution was examined by electrochemical methods. The best corrosion inhibition rate of Schiff base A reached to 94.06% with the concentration of 10 mmol/L and assembly time of 4 h at 25 ℃. For Schiff base B, the best corrosion inhibition rate reached to 96.62% with the concentration of 15 mmol/L and assembly time of 6 h at 25 ℃. The results showed that two inhibitors had good corrosion inhibition performance, and the inhibition effect of B was better than that of A.